Cee® 300MXD Megasonic Cleaner

Apogee Spin Coater

The Cee® 300MXD megasonic developer & cleaning system applies uniform acoustic energy to spinning substrates to resolve high-density features. This design ensures enhanced development resolution and mitigates risk to fragile device structures.

Benefits
  • Substrate size range: 50–300 mm
  • Greatly enhances developing/cleaning of high-aspect-ratio structures
  • Capable of removing particles < 0.15 µm in size
  • Fully programmable and automatic
  • Optimization available for post-debonding adhesive cleaning on full-thickness and thinned substrates
  • Optional heated dispense for metal lift-off and metal etching applications
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