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Reveal the Pattern

Complete spin spray developing the first time, every time.

A picture of the Apogee® Spin Coater

Apogee® Spin Developer

For substrates up to 200mm round or 6″ x 6″ square

A picture of an Apogee® 450 Spin Coater

Apogee® 450 Spin Developer

For substrates up to 450mm round or 14″ x 14″ square

Beginning February 2024, all standard Cee® Apogee® Spin Coaters will bear the Intertek ETL NRTL mark, certifying adherence with North American safety standards.

Improve Yield

Pattern Perfection

Don’t risk your lithography results with outdated bath immersions and stopwatches. Get unmatched precision, consistent chemistry, flawless pattern development, and a clean dry wafer—every time with the Apogee® Spin Developer.

Versatility

One Tool, Many Solutions

Whether it’s photomasks or wafers, cleaning, developing, or metal lift-off, you’re covered. With direct spray, stream dispense, or optional high-impingement spray, you can count on consistent results.

Superior Performance

The Automated Advantage

Unlock your new standard of excellence and experience what manual processes can’t achieve.  Step-by-step programmability and adjustable dispense configurations provide unparalleled repeatability, enhance aspect ratios, and reduce waste.

Reliability

Engineered for Excellence

For almost 40 years, professionals around the globe have trusted Cee® systems to provide dependable, long-lasting performance they can count on. Whether in cutting-edge R&D labs or high-demand production environments, Cee® Spin Developers are constructed with top-quality materials and subjected to rigorous durability testing. 

Your Premium Choice

Premium Features Built-In

Engineered for superior performance, usability, versatility—and peace of mind.

Refined Control

Master Your Process

Elevate your process with advanced controls, a multitude of sensors, and recipe-driven dispenses. Effortlessly fine-tune every detail using our intuitive, user-friendly interface. Achieve exceptional results with ease.

Safety

Leading the Charge

NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.

Cee® Spin Developers are NRTL listed right out of the box…

…your safety department is going to love you.

DataStream™ OS

- Included on every Apogee® Spin Coater

Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.

Unlimited Recipes, Unlimited Steps

Create and store unlimited recipes with unlimited steps. Use pre-defined commands to streamline your setup and execution.

Record Everything

Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.

Remote Access and Managment

Access your Apogee® Spin Coater remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.

Monitor All the Things

DataStream™ technology monitors key spin-coating parameters—exhaust, vibration, tool level, spin speed, chuck vacuum, ambient temperature/humidity, and more— to ensure precise control for optimal results.

Make the Best Even Better

When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.

Need a Custom Solution?

With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.

About Us
Leading the industry in high performance wafer-processing equipment since 1987.