Cee® 200X Photoresist Spinner 1 – LNF Wiki

Unknown
AZ12XT, SPR 220
Spin Coater, 200mm Spin Coater, 200X (Legacy)
Source:LNF Wiki, University of Michigan Lurie Nanofabrication Facility
Material: AZ12XT, SPR 220
Source:Sic
The University of Michigan LNF Wiki lists a Cee® 200X photoresist spinner as a fully programmable, automatic-dispense coating system with support for 4-inch and 6-inch wafers as well as pieces up to 2 inches.
Publication Year: Unknown

Process Overview

This University of Michigan LNF tool listing identifies a Cee® 200X photoresist spinner used for photoresist coating within the facility. The indexed description explicitly states that the system is fully programmable and includes automatic dispense, with multiple chucks available for 4-inch wafers, 6-inch wafers, and pieces up to 2 inches. The tool is also noted as being located in 1440C, making this a solid university facility reference for a specific legacy Cee® spin coating platform in active cleanroom use.

Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown
Unknown
Spin Coater, 200mm Spin Coater, 200X (Legacy)
The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch
MIBK
Spin Coater, 200mm Spin Coater, 100 (Legacy)
This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

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Unknown
Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)
The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.