Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Bake Plate, Spin Coater
Nanofabrication, Open Facitlity
Materials: Unknown

University of Kansas Nanofabrication Facility

Cee® 1300X (Legacy), Cee® 200X (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.

Publication Year: Unknown

Process Overview

This University of Kansas Nanofabrication Facility page identifies a Cee® spin coating and bake tool set within its photolithography resources. The page explicitly lists a Cee® 200CBX Programmable Spin Coater with saved programmable presets, stepped control of acceleration and angular speed, and available 2.25-inch, 0.75-inch, and 0.3125-inch spin chucks for a variety of substrate sizes. It also lists both a Cee® 1300X Hot Plate and a Cee® Apogee® Hot Plate, each described as 10-inch hot plates with programmable presets, infinite steps, and three baking methods: contact, vacuum, and proximity. The hot plates are stated to heat to 300 °C with a maximum ramp rate of 6 °C per minute.

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