The AggieFab nanofabrication facility incorporates a full Cee® lithography workflow, integrating spin coating, thermal processing, and development within a shared cleanroom environment. Spin coating systems are used to apply SU-8 for structural layers, AZ-series photoresists such as AZ3310 and S18xx for photolithographic patterning, polyimide for insulating films, and PMMA for electron-beam lithography processes.
Following coating, substrates are transferred to Cee® bake plates for controlled soft bake and post-exposure bake steps, and then processed through Cee® developer systems to define patterned features. This sequence enables consistent film formation and reliable pattern transfer across a range of materials and applications.
The use of an integrated coating, bake, and develop toolset supports repeatable processing in a multi-user environment, where maintaining consistency across different materials and workflows is essential.
