Cee® Apogee® Spin Coater – LNF Wiki

4 inch, 6 inch, Unknown

AZ12XT, KMPR, S1813, SPR 220, SPR 995

Spin Coater, 200mm Spin Coater, Apogee® 200 Spin Coater

Source:LNF Wiki, University of Michigan Lurie Nanofabrication Facility

Material: AZ12XT, KMPR, S1813, SPR 220, SPR 995

Source:Unknown

The University of Michigan LNF Wiki lists a Cee® Apogee® Spin Coater as a fully programmable, manual-dispense photoresist coating system that accepts pieces, 4-inch wafers, and 6-inch wafers.

Publication Year: unknown

Process Overview

This University of Michigan LNF reference identifies a Cee® Apogee® Spin Coater within the facility’s lithography tool set. The indexed tool description explicitly states that it is a fully programmable, manual-dispense, photoresist spin coater and that it can accept pieces, 4-inch wafers, and 6-inch wafers. The broader LNF equipment listing also shows the Cee® Apogee® Spin Coater alongside other lithography tools in the cleanroom, making this a solid university facility reference for active Cee® coating equipment in shared nanofabrication use.

View Full Publication

Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.