Cee® Lithography Tools – Utah Nanofab

Unknown

AZ40XT, AZ9260, AZ Barli II ARC, AZ MiR 701, HMDS, LOR 10B, ma-P 1275, nLOF 2020, S1813, SU-8

Spin Coater, 200mm Spin Coater, Apogee® 200 Spin Coater, 200X (Legacy), 100 (Legacy), 200mm Spin Developer, 200XD(Legacy), Bake Plates, Apogee® 200 Bake Plate

Source:Utah Nanofab, University of Utah

Material: AZ40XT, AZ9260, AZ Barli II ARC, AZ MiR 701, HMDS, LOR 10B, ma-P 1275, nLOF 2020, S1813, SU-8

Source:Unknown

Utah Nanofab lists multiple specific Cee® tools across its cleanroom lithography workflow, including legacy Cee® 100 and 200X-series spinners, a Cee® 200XD develop spinner, and current-generation Apogee® spin coat and bake capability. The site also explicitly lists supported resist materials used within its photolithography process set.

Publication Year: Unknown

Process Overview

Utah Nanofab presents Cee® equipment as part of its open-access photolithography infrastructure. Its equipment pages and tool lists explicitly reference Cee® 100, Cee® 200X 1800 Spinner, Cee® 200X 9260 Spinner, Cee® 200XD Develop Spinner, Cee® Apogee Spin Coater, and Cee® Apogee N2 Hot Plate. Together, these pages show coverage across coating, bake, and develop steps within the facility’s lithography workflow. The Utah Nanofab process pages also explicitly list photoresist and lithography materials used with this workflow, including S1813, nLOF 2020, LOR 10B, SU8, HMDS, and additional AZ-series materials. That makes this a strong university facility reference because it ties named Cee® platforms to a clearly defined cleanroom photolithography process set rather than just listing generic spin-coating capability.

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