This University of Kansas Nanofabrication Facility page identifies a Cee® spin coating and bake tool set within its photolithography resources. The page explicitly lists a Cee® 200CBX Programmable Spin Coater with saved programmable presets, stepped control of acceleration and angular speed, and available 2.25-inch, 0.75-inch, and 0.3125-inch spin chucks for a variety of substrate sizes. It also lists both a Cee® 1300X Hot Plate and a Cee® Apogee® Hot Plate, each described as 10-inch hot plates with programmable presets, infinite steps, and three baking methods: contact, vacuum, and proximity. The hot plates are stated to heat to 300 °C with a maximum ramp rate of 6 °C per minute.
