Cee® Lithography Tools – Lurie Nanofabrication Facility

Spin Coater
Lithography, Nanofabrication, Open Facitlity
Materials: AZ12XT, AZ726, KMPR, LOR10B, Photoresist, S1813, SPR220, SPR995, Unknown

University of Michigan Lurie Nanofabrication Facility

Apogee® 200 Spin Coater, Cee® 200 (Legacy), Cee® 200X (Legacy)

Wafer Size: 100mm, 125mm, 150mm, 200mm, 50mm, 75mm

Substrate Type: Not Specified

The University of Michigan Lurie Nanofabrication Facility equipment directory lists multiple Cee® lithography tools, including coating, developing, and Apogee® spin coating platforms within the facility’s lithography area.

Publication Year: Unknown

Process Overview

This Lurie Nanofabrication Facility equipment page functions as a directory of lithography tools and explicitly lists several Cee® systems in active facility use. The lithography section includes a Cee® 100CB Spin Coater, Cee® 200X PR Spin Coater #1, Cee® 200X PR Spin Coater #2, Cee® Developer #1, Cee® Developer #2, and a Cee® Apogee® Spin Coater. Because this page is an index, it confirms installed Cee® equipment at the facility, but it does not provide the detailed material, wafer size, or substrate information that appears on the individual tool pages.

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Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

Spin Coater
Bio, Microfluidics
Materials: OSTE-AS Polymer

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

Bake Plate, Spin Coater
Sensor
Materials: Photoresist, PMMA

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

Spin Coater
Materials: AZ4620, HMDS, LOR10B, PDMS, Photoresist, S1805, SU-8

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.