The study used silicon dioxide porous glass substrates preloaded with fluorene so photoresist would stay on the surface. SU-8 2005 was spin coated with a Cee® Apogee® Spin Coater, then exposed, developed in PGMEA, and rinsed with IPA. AZnLOF-2020 was later used as a lift-off layer, and the SU-8 was hard-baked at 105 °C for 2 h before PTFE sputtering.