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Backside Rinse

Backside Rinse (BSR) is used to remove unwanted contamination from the underside of the substrate. Applying a rinse to the back of the substrate while it is spinning removes residual photoresist or developing solution.

  • adjustable nozzle compatible with solvent or aqueous solutions
  • removes unwanted material to protect downstream processes 
  • fully automated via DataStream™ recipe controls
  • fluid path consists of PFA, PTFE, and  304/316 stainless steel 
  • integrated valve provides adjustable flow control
  • pressure can source
    • N2 or CDA pressurized chemical reservoir 
    • DataStream™ integrated empty float sensor
    • optional PFA coating
    • available sizes are 1-10gal (3.7-37 L)

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