Lithography – The Advanced Science Research Center Nanofabrication Facility

Bake Plate, Spin Coater
Lithography, Nanofabrication, Open Facitlity
Materials: E-beam, Photoresist

The Advanced Science Research Center, CUNY Graduate Center

Cee® 1300X (Legacy), Cee® 200X (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

The CUNY ASRC Nanofabrication Facility lithography page lists multiple Cee® coating systems, including a Cee® Stand-Alone Spin Coater / hotplate for electron beam resists and two additional Cee® Spin Coaters for photoresist processing and other non-standard materials.

Publication Year: Unknown

Process Overview

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