The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.
Publication Year: Unknown
Process Overview
The BioNIUM Nanofabrication Facility tool index lists a Cee® 200X Precision Spin Coater within its available fabrication equipment. A separate manuals page also identifies a Cee® 200X Precision Spin Coater User Manual, reinforcing that this specific Cee® platform is part of the facility’s active tool set. The accessible search results do not expose material, wafer size, or substrate details, so those should remain unspecified for this entry.
Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics
4 inch
MIBK
Spin Coater, 200mm Spin Coater, 100 (Legacy)
This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit
The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.
The University of Michigan Lurie Nanofabrication Facility equipment directory lists multiple Cee® lithography tools, including coating, developing, and Apogee® spin coating platforms within the facility’s lithography area.
