Apogee®450 Spin Developer

Benchtop platform for use with up to 450mm wafers

Scale Up

Move Beyond

The Apogee® 450 Spin Developer is designed to handle your large, heavy substrates with high torque, an expanded bowl capacity, and modern controls. Its sleek tabletop design seamlessly integrates into any lab or fabrication environment, helping you scale and optimize your processes.

Versatility

Big, Heavy, Weird? No Problem

Ultra-thin wafers, film frames, photomasks, and custom shapes?

Unconventional doesn’t have to be complicated. The Apogee® 450 Spin Developer is the perfect solution for research labs and manufacturers dealing with custom dimensions. Effortlessly handle sizes and shapes beyond typical semiconductor standards.

Easy Install

Streamlined Setup

Built to fit any workspace. Enjoy top-tier performance with no complicated installations—no fume hood needed.

Set It

Place on bench

Connect It

Plug in utilities

Use It

Run with confidence 

Designed for Results

Time After Time

Apogee® Spin Developers provide flexibility, repeatability, and long-lasting durability for the most challenging applications. Rely on cutting-edge technology and top-tier process support to drive your success at every stage.

Premium Features Built-In

Engineered for superior performance, usability, versatility—and peace of mind.

DataStream™ OS

- Included on every Apogee® Spin Developer

Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.

Unlimited Recipes, Unlimited Steps

Create and store unlimited recipes with unlimited steps. Use pre-defined commands to streamline your setup and execution.

Record Everything

Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.

Remote Access and Managment

Access your Apogee® Spin Developer remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.

Monitor All the Things

DataStream™ technology monitors key spin-coating parameters—exhaust, vibration, tool level, spin speed, chuck vacuum, ambient temperature/humidity, and more— to ensure precise control for optimal results.
Safety

Leading the Charge

NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.

Cee® spin developers are NRTL listed right out of the box…

…your safety department is going to love you.

A photograph of the Cee® Apogee® Spin Coater's NRTL label.

Make the Best Even Better

When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.

Apogee® 450 Spin Developer Specs - Benchtop

Max Substrate Size

450mm Round or 14″ x 14″ Square

Max Spin Speed

6,000 rpm

Max Acceleration

30,000 rpm/s

Spin Speed Repeatability

0.2 rpm

Acceleration Resolution

< 0.2 rpm/s

Spin Speed Resolution

0.2 rpm

Programmablility
GUI

7″ Full Color Touchscreen

Number of Recipes

Unlimited

Step Time Resolution

0.1 s

Dimensions
Weight

8115 lb (52.2kg)

Shipping Weight (Equipment Only)

220 lb (100kg) 

Dimensions

W: 27.625″ (702mm)

D: 30.75″ (710mm)

H: 23.5″ (597mm)

Shipping Dimensions

W: 34″ (864mm)

D: 34″ (864mm)

H: 38″ (965mm)

Utilities
Voltage

208-230 VAC 

Drain Port

3/4″ OD

Full Load Current

6A (max)

Exhaust Port

1.5″ OD, 0.4″ H2O @ 30CFM (100Pa @ 50CMH)

Vacuum

1/4″ Push to Connect, <20″ Hg (33kPa)

N2/CDA (only used for automated dispenses)

1/4″ Push to Connect, 70psi (482kPa)

A photograph of Cost Effective Equipment's engineering team designing custom process solutions.

Need a Custom Solution?

With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.

About Us
Leading the industry in high performance wafer-processing equipment since 1987.
An operator holding a patterned silicon wafer.