This preprint describes a glass-based microfluidic bioelectrochemical cell platform for studying extracellular electron uptake in microbes. The fabrication flow explicitly references an Apogee® Spin Coater for coating KL8020 HMDS Spin-On Primer, and the process also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100 within the device fabrication sequence.

Cornell NanoScale Facility lists multiple specific Cee® lithography support tools in its open-access cleanroom, including Cee® 1300X hotplates, Cee® Apogee spinners, and a Cee® Flange Spinner Model 200 platform used for edge bead removal.

This doctoral thesis investigates SiC-based memristors for neuromorphic computing. Within the fabrication flow, the photolithography process explicitly includes S1813 positive photoresist, AZ2070 negative resist, silicon wafers, and a Cee™ Apogee Spin Coater and Bake Plate module for the resist spin/bake step.

The KU Nanofabrication Facility provides Cee® spin coating and bake systems as part of its shared cleanroom infrastructure for lithography and thin-film processing.

The AggieFab facility at Texas A&M utilizes a complete Cee® lithography workflow, including spin coating, bake, and develop systems, to support a wide range of thin-film and photolithographic processes in a shared research environment.

This work demonstrates fabrication of flexible near-field electronic biosensors using spin-coated SU-8 and AZ3310 photoresists. The study explicitly references Cee® 200X-F and Apogee® systems for these coating steps.

A series of controlled experiments were performed to achieve sub-1% total thickness variation across 300 mm silicon wafers using a Cee® 300X (Apogee™) spin coater platform. Multiple process variables were evaluated, including dispense method (static vs dynamic), ramp-to-spin rates, exhaust control, pre-wet conditions, and spread spin behavior. The results identified exhaust control and ramp-to-spin as the most significant contributors to coating uniformity.