Cee® Spin Coating and Bake Systems – KU Nanofabrication Facility

Bake Plate, Spin Coater
Nanofabrication, Open Facitlity
Materials: Unknown

University of Kansas Nanofabrication Facility

Cee® 1300X (Legacy), Cee® 200X (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

The KU Nanofabrication Facility provides Cee® spin coating and bake systems as part of its shared cleanroom infrastructure for lithography and thin-film processing.

Publication Year: Unknown

Process Overview

The KU Nanofabrication Facility includes Cee® spin coating and bake systems within its open-access cleanroom environment, supporting thin-film deposition and thermal processing steps used in lithography workflows. Spin coating is used to apply material layers for patterning, followed by controlled bake steps to prepare and stabilize those films for subsequent processing. These systems are integrated into a shared user facility, enabling consistent coating and thermal processing across a range of research applications. The inclusion of both spin coating and bake capabilities supports repeatable film formation and process control within a multi-user nanofabrication environment.

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Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

Spin Coater
Bio, Microfluidics
Materials: OSTE-AS Polymer

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Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

Bake Plate, Spin Coater
Sensor
Materials: Photoresist, PMMA

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

Spin Coater
Materials: AZ4620, HMDS, LOR10B, PDMS, Photoresist, S1805, SU-8

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.