Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

Bio
Materials: AZ4620, HMDS, LOR10B, Nafion, Photoresist, SU-8

Preprints.org

Substrate Type: Borosilicate Glass, Glass

This preprint describes a glass-based microfluidic bioelectrochemical cell platform for studying extracellular electron uptake in microbes. The fabrication flow explicitly references an Apogee® Spin Coater for coating KL8020 HMDS Spin-On Primer, and the process also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100 within the device fabrication sequence.

Publication Year: 2025

Process Overview

This work presents a scalable glass-based microfluidic bioelectrochemical cell platform designed for multiplexed studies of microbial extracellular electron uptake. In the fabrication sequence, 100 mm borosilicate glass wafers are first prepared and then coated with KL8020 HMDS Spin-On Primer using an Apogee® Spin Coater, followed by a soft bake at 115°C for 3 minutes to promote photoresist adhesion. The lithography stack then includes sequential spin coating of LOR 10B and Microposit™ S1805™, with defined soft-bake steps of 10 minutes at 195°C and 1 minute at 115°C, respectively. Later process steps also explicitly call out AZ P4620 photoresist for protecting electrode areas during chlorination and SU-8 2100 photoresist, spin coated to 100 µm thickness, for fabrication of the PDMS replica mold. Together, these details make this a strong reference for Apogee® use in university microfabrication, with clearly stated resist materials, coating steps, and substrate formats tied directly to the device fabrication

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Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

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Materials: AZ4620, HMDS, LOR10B, PDMS, Photoresist, S1805, SU-8

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.