Apogee® 200 Spin Coater

X-Pro platform for use with up to 200mm wafers

A 200mm Apogee® Spin Coater installed in a Cee® X-Pro II Workstation.
All-in-One

Transform Your Workflow

Everything you expect from an Apogee® Spin Coater streamlined into a complete solution. With factory direct integration, you benefit from a reliable system built to your specifications. 

X-Pro Workstation

Whether you need a single tool or ten, fume control or a cleanroom environment, the Cee® X-Pro II Workstation is the perfect alternative to typical wet benches.

A fleet of Cee® full sized X-Pro II Workstations outfitted with various process modules for the processing of semiconductor substrates.

Plug and Play

Fume Control

Easy Maintenance

Below-Deck Hardware

Clear the Clutter!

Provide your operators a clean, professional aesthetic while maximizing workspace and flow. The sleek, low-profile design also provides visibility of your process for optimal control and monitoring. 

A process engineer using a 200mm Apogee® Spin Coater that is installed in a Cee® X-Pro II Workstation.
Designed for Success

Built For You

Cee® Spin Coaters offer flexibility, repeatability, and endurance for even the most demanding applications. Backed by premier customer support, we deliver sophisticated technology you can trust, ensuring your success every step of the way.

Premium Features Built-In

Engineered for superior performance, usability, versatility—and peace of mind.

DataStream™ OS

- Included on every Apogee® Spin Coater

Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.

Unlimited Recipes, Unlimited Steps

Create and store unlimited recipes with unlimited steps. Use pre-defined commands to streamline your setup and execution.

Record Everything

Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.

Remote Access and Managment

Access your Apogee® Spin Coater remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.

Monitor All the Things

DataStream™ technology monitors key spin-coating parameters—exhaust, vibration, tool level, spin speed, chuck vacuum, ambient temperature/humidity, and more— to ensure precise control for optimal results.
Safety

Leading the Charge

NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.

Cee® spin coaters are NRTL listed right out of the box…

…your safety department is going to love you.

A photograph of the Cee® Apogee® Spin Coater's NRTL label.

Make the Best Even Better

When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.

Apogee® 200 Spin Coater Specs - X-Pro

Max Substrate Size

200mm Round or 6″ x 6″ Square

Max Spin Speed

12,000 rpm

Max Acceleration

30,000 rpm/s

Spin Speed Repeatability

< 0.2 rpm

Acceleration Resolution

< 0.2 rpm/s

Spin Speed Resolution

< 0.2 rpm

Programmablility
GUI

7″ Full Color Touchscreen (included)

Number of Recipes / Steps

Unlimited / Unlimited

Step Time Resolution

0.1 s

Dimensions
Weight

40 lb (18.2kg) – Add X-Pro II Workstation for Final Weight

Shipping Weight (Equipment Only)

65 lb (29.5kg) – Add X-Pro II Workstation for Final Shipping Weight

Dimensions

N/A (Pre-Installed Into X-Pro II Workstation)

Shipping Dimensions

N/A (Pre-Installed Into X-Pro II Workstation)

Utilities
Voltage

208-230 VAC (Supplied by X-Pro II Workstation)

Drain Port

3/4″ OD

Full Load Current

6A (max) (Supplied by X-Pro II Workstation)

Exhaust Port

1″ OD, 0.4″ H2O@5.8CFM (100Pa@10CMH)

Vacuum

1/4″ Push to Connect, <20″ Hg 33kPa abs (Supplied by X-Pro II Workstation)

N2/CDA (only used for automated dispenses)

70psi (482kPa) (Supplied by X-Pro II Workstation)

A photograph of Cost Effective Equipment's engineering team designing custom process solutions.

Need a Custom Solution?

With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.

About Us
Leading the industry in high performance wafer-processing equipment since 1987.
An operator holding a patterned silicon wafer.