Apogee® 450 Spin Coater

Benchtop platform for use with up to 450mm wafers

The Perfect Fit

Big Substrates, Bigger Results

Propel your process with the Apogee® 450 Spin Coater—a powerhouse on an impressive scale. Handle it all, even large, heavy, and uniquely shaped substrates. Packed with more torque, greater power, and an expanded bowl capacity, its sleek, tabletop design is a perfect fit for your lab or fab.

Versatile Substrate Handling

Bring It On!

Accommodate a wide range of  substrate configurations, from standard wafers to unique geometries and specialized materials. The adaptable design handles substrates well beyond traditional semiconductor specifications, making it ideal for research facilities and manufacturers working with custom dimensions. 

Ultra-thin wafers? Film frames? Photomasks? Custom shapes? No problem!

Your Premium Choice

Seamless Integration

Designed for hassle-free setup in your workspace. Get professional-grade performance without the need for complex installations.

Set It

Place on bench

Connect It

Plug in utilities

Use It

Run with confidence 

Designed for Success

Built For You

Cee® Spin Coaters offer flexibility, repeatability, and endurance for even the most demanding applications. Backed by premier customer support, we deliver sophisticated technology you can trust, ensuring your success every step of the way.

Premium Features Built-In

Engineered for superior performance, usability, versatility—and peace of mind.

DataStream™ OS

- Included on every Apogee® Spin Coater

Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.

Unlimited Recipes, Unlimited Steps

Create and store unlimited recipes with unlimited steps. Use pre-defined commands to streamline your setup and execution.

Record Everything

Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.

Remote Access and Managment

Access your Apogee® Spin Coater remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.

Monitor All the Things

DataStream™ technology monitors key spin-coating parameters—exhaust, vibration, tool level, spin speed, chuck vacuum, ambient temperature/humidity, and more— to ensure precise control for optimal results.
Safety

Leading the Charge

NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.

Cee® spin coaters are NRTL listed right out of the box…

…your safety department is going to love you.

A photograph of the Cee® Apogee® Spin Coater's NRTL label.

Make the Best Even Better

When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.

Apogee® 450 Spin Coater Specs - Benchtop

Max Substrate Size

450mm Round or 14″ x 14″ Square

Max Spin Speed

6,000 rpm

Max Acceleration

30,000 rpm/s

Spin Speed Repeatability

0.2 rpm

Acceleration Resolution

< 0.2 rpm/s

Spin Speed Resolution

0.2 rpm

Programmablility
GUI

7″ Full Color Touchscreen

Number of Recipes

Unlimited

Step Time Resolution

0.1 s

Dimensions
Weight

85 lb (38.6kg)

Shipping Weight (Equipment Only)

200 lb (90.7kg) 

Dimensions

W: 27.625″ (702mm)

D: 30.75″ (710mm)

H: 15.75″ (400mm)

Shipping Dimensions

W: 34″ (864mm)

D: 34″ (864mm)

H: 38″ (965mm)

Utilities
Voltage

208-230 VAC 

Drain Port

3/4″ OD

Full Load Current

6A (max)

Exhaust Port

1.5″ OD, 0.4” H2O @ 30CFM (100Pa @ 50CMH)

Vacuum

1/4″ Push to Connect, <20″ Hg (33kPa)

N2/CDA (only used for automated dispenses)

70psi (482kPa)

A photograph of Cost Effective Equipment's engineering team designing custom process solutions.

Need a Custom Solution?

With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.

About Us
Leading the industry in high performance wafer-processing equipment since 1987.
An operator holding a patterned silicon wafer.