Apogee® 200 Spin Developer

Flange-Mount platform for use with up to 200mm wafers

Flush-Mount Design

Simplify your Setup

Easily install your Apogee® Spin Developer into your wetbench, fume hood, or glove box, for seamless integration into your existing infrastructure. The top-mount flange design ensures fast, hassle-free setup.

Looking for a wet bench or glove box solution? Get in touch for recommendations from our trusted partners.”

Ergonomic Flexibility

Control at Your Fingertips

Take control of your process. With installation flexibility, the touchscreen panel can be placed up to 15 feet from the main unit, ensuring maximum ergonomic comfort. Cramped fab or spacious lab, you’ll enjoy seamless operation and convenience with every touch.

Low Profile

Reclaim your Space

Imagine a tidy, efficient environment where you can focus on what really matters. The Apogee® Spin Developer’s sleek, flush-mount design keeps critical hardware hidden under the deck, maximizing your workspace and offering a clear view of operations.

Designed for Results

Time After Time

Apogee® Spin Developers provide flexibility, repeatability, and long-lasting durability for the most challenging applications. Rely on cutting-edge technology and top-tier process support to drive your success at every stage.

Premium Features Built-In

Engineered for superior performance, usability, versatility—and peace of mind.

DataStream™ OS

- Included on every Apogee® Spin Developer

Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.

Unlimited Recipes, Unlimited Steps

Create and store unlimited recipes with unlimited steps. Use pre-defined commands to streamline your setup and execution.

Record Everything

Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.

Remote Access and Managment

Access your Apogee® Spin Developer remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.

Monitor All the Things

DataStream™ technology monitors key spin-coating parameters—exhaust, vibration, tool level, spin speed, chuck vacuum, ambient temperature/humidity, and more— to ensure precise control for optimal results.
Safety

Leading the Charge

NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.

Cee® spin developers are NRTL listed right out of the box…

…your safety department is going to love you.

A photograph of the Cee® Apogee® Spin Coater's NRTL label.

Make the Best Even Better

When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.

Apogee® 200 Spin Developer Specs - Flange Mount

Max Substrate Size

200mm Round or 6″ x 6″ Square

Max Spin Speed

12,000 rpm

Max Acceleration

30,000 rpm/s

Spin Speed Repeatability

< 0.2 rpm

Acceleration Resolution

< 0.2 rpm/s

Spin Speed Resolution

< 0.2 rpm

Programmablility
GUI

7″ Full Color Touchscreen (included)

Number of Recipes / Steps

Unlimited / Unlimited

Step Time Resolution

0.1 s

Dimensions
Weight

40 lb (18.2kg)

Shipping Weight (Equipment Only)

85 lb (38.6kg)

Dimensions

W: 14″ (356mm)

D: 17″ (432mm)

H: 8.25″ (210mm)

Shipping Dimensions

W: 28″ (712mm)

D: 28″ (712mm)

H: 29″ (737mm)

Utilities
Voltage

100-120 or 208-230 VAC 

Drain Port

3/4″ OD

Full Load Current

6A (max)

Exhaust Port

1″ OD, 0.4″ H2O@5.8CFM (100Pa@10CMH)

Vacuum

1/4″ Push to Connect, <20″ Hg (33kPa)

N2/CDA (only used for automated dispenses)

1/4″ Push to Connect, 70psi (482kPa)

A photograph of Cost Effective Equipment's engineering team designing custom process solutions.

Need a Custom Solution?

With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.

About Us
Leading the industry in high performance wafer-processing equipment since 1987.
An operator holding a patterned silicon wafer.