Neuromorphic Computing of SiC Based Memristor

This thesis focuses on the development and characterization of SiC-based memristors for neuromorphic computing applications. In the fabrication section, the photolithography workflow explicitly references S1813 positive photoresist and AZ2070 negative resist, with silicon wafers also called out in the process discussion. The resist spinning step is explicitly stated to be performed using a Cee™ Apogee Spin Coater and Bake Plate module, integrating both coating and baking functions into the lithography sequence. This makes the thesis a solid university research reference linking Cee equipment directly to resist processing within an advanced device fabrication workflow.