This University of Michigan LNF tool listing identifies a Cee® 200X photoresist spinner used for photoresist coating within the facility. The indexed description explicitly states that the system is fully programmable and includes automatic dispense, with multiple chucks available for 4-inch wafers, 6-inch wafers, and pieces up to 2 inches. The tool is also noted as being located in 1440C, making this a solid university facility reference for a specific legacy Cee® spin coating platform in active cleanroom use.