Cee® Spin Coater #1 and #2 – ASU NanoFab

2 inch, 3 inch, 4 inch, 5 inch, 6 inch, 8 inch

Positive Photoresist

Spin Coater, 200mm Spin Coater, 200X (Legacy), 1300X (Legacy)

Source:Arizona State University Core Research Facilities, NanoFab

Material: Positive Photoresist

Source:Unknown

ASU NanoFab lists Cee® Spin Coater #1 and #2 as photoresist coating systems in its cleanroom. The page explicitly identifies Cee® Spin Coater #1 as having a programmable precision hot plate bake, Cee® Spin Coater #2 as a stand-alone Spin Coater, and names the Cee® 200CBX precision coat-bake system as the integrated platform.

Publication Year: Unknown

Process Overview

This ASU NanoFab equipment listing identifies two Cee® photoresist coating systems within the facility’s lithography tool set. The page states that Cee® Spin Coater #1 includes a programmable Precision Hot Plate Bake, while Cee® Spin Coater #2 is configured as a stand-alone Spin Coater. It also explicitly names the Cee® 200CBX precision coat-bake system, describing it as a track-quality precision Spin Coater combined with a high-uniformity bake plate and a Windows-based graphical user interface for program entry, monitoring, and storage. The page further states that these systems apply coatings to substrates up to 200 mm round or 7-inch square, with all coatings hand dispensed using pipettes. That makes this a strong university facility reference because it ties specific Cee® platform names to defined coating and bake capability in active cleanroom use.

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Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.