This University of Houston NanoFabrication Facility page describes spin coating as a standard process used to deposit uniform thin films across substrates. The process is explicitly tied to use of a Cee® Spin Coater, where liquid materials such as photoresist and polymer solutions are dispensed onto the substrate and spread via controlled rotation to achieve uniform coatings.
The page explains that coating thickness is governed by parameters such as spin speed, viscosity, and solution concentration, reinforcing the role of controlled spin coating in lithography preparation and thin film applications. While the page focuses on process fundamentals, it clearly anchors those steps to the Cee® Spin Coater, making this a solid facility-level reference for real-world use of Cee® coating equipment in university nanofabrication workflows.
