Cee® Apogee® Spin Coater – Penn Nano Wiki

2 inch, 3 inch, 4 inch, 5 inch, 6 inch

Negative Photoresist, Positive Photoresist

Spin Coater, 200mm Spin Coater, Apogee® 200 Spin Coater

Source:University of Pennsylvania Singh Center for Nanotechnology (Penn Nano Wiki)

Material: Negative Photoresist, Positive Photoresist

Source:Unknown

The Penn Nano Wiki lists a Cee® Apogee® Spin Coater used for photoresist coating in lithography processes, supporting substrates up to 6-inch wafers within a shared nanofabrication environment.

Publication Year: Unknown

Process Overview

This University of Pennsylvania Penn Nano Wiki entry documents the use of a Cee® Apogee® Spin Coater within the Singh Center cleanroom for photoresist coating applications. The system is explicitly described as a programmable spin coating platform used to apply photoresist films in preparation for lithography. The page indicates that the system supports wafers up to 6 inches, placing it within standard university cleanroom processing capabilities. While the content is focused on tool usage rather than detailed process flows, it clearly ties photoresist coating operations to the Cee® Apogee® Spin Coater, making it a relevant facility reference for active use of Cee® equipment in academic nanofabrication environments.

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Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.