This University of Kansas facility page documents the use of a Cee® Spin Coater specifically for processing PDMS (polydimethylsiloxane). The page highlights spin coating as a method to control PDMS film thickness for applications such as soft lithography and microfluidic device fabrication.
Unlike standard photoresist workflows, this reference emphasizes polymer processing, showing that the Cee® Spin Coater is used beyond traditional lithography to handle viscous materials like PDMS. This makes it a strong example of expanded application use, where controlled spin coating enables uniform elastomer layers critical for replication and device formation in soft lithography environments.
