Nanofabrication Equipment & Instrumentation – Penn Nano
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Spin Coater, 200mm Spin Coater, 200X (Legacy)
Source:University of Pennsylvania Singh Center for Nanotechnology (Penn Nano)
Material: Unknown
Source:Unknown
The Penn Nano equipment page includes imagery of a Cee® 200X Spin Coater within its spinner and solvent processing area, indicating active use of Cee® coating equipment in the facility.
Publication Year: Unknown
Process Overview
This University of Pennsylvania Singh Center equipment page outlines nanofabrication capabilities, including spinner and solvent processing benches where a Cee® 200X Spin Coater is installed. The system is used within these solvent processing areas to support coating and solvent-based lithography workflows as part of standard cleanroom operations.
The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.
Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics
4 inch
MIBK
Spin Coater, 200mm Spin Coater, 100 (Legacy)
This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit
The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.
