Spin Coating – University of Kentucky CeNSE

Unknown

Negative Photoresist, Positive Photoresist

Spin Coater, 100 (Legacy)

Source:University of Kentucky Center for Nanoscale Science and Engineering (CeNSE)

Material: Negative Photoresist, Positive Photoresist

Source:Unknown

The University of Kentucky CeNSE spin coating page explicitly references the Cee® Model 100 and 150 and describes them as part of the facility’s spin coating capability for thin-film application.

Publication Year: Unknown

Process Overview

his University of Kentucky CeNSE page describes spin coating as a process for applying thin films and explicitly identifies the Cee® Model 100 and 150. The page states that the system incorporates a stainless steel spin bowl, PTFE drain and exhaust connections, a hardened alloy steel spindle, a toothed belt drive, a servo motor, and an integral optical encoder for closed-loop digital motor control. It also explains that each program on a Cee® Spin Coater may contain up to ten separate process steps, supporting more complex coating requirements when needed.

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Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.