New Equipment at CNF – Cee® Model 100 Spin Coaters

Unknown

Negative Photoresist, Positive Photoresist

Spin Coater, 200mm Spin Coater, 100 (Legacy)

Source:Cornell NanoScale Facility, NanoMeter newsletter, Volume 15, Number 1.

Material: Negative Photoresist, Positive Photoresist

Source:Unknown

This Cornell NanoScale Facility newsletter identifies two bench-top mounted Cee® Model 100 Spin Coaters used for resist coating of wafers, with support for substrates up to 200 mm round or 6-inch square.

Publication Year: 2004

Process Overview

n the “New Equipment at CNF” section, Cornell NanoScale Facility explicitly lists Cee® Model 100 Spin Coaters as part of its tool set. The article states that CNF has two bench-top mounted Cee Model 100 systems used for resist coating of wafers. It also notes that each unit has 10 available recipes with up to 10-step programming for acceleration, speed, and time. The listed capability covers up to 200 mm round or 6-inch square substrates, making this a strong facility reference for legacy Cee® coating equipment in active university nanofabrication use.

View Full Publication

Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.