Cee® Lithography Tools – Lurie Nanofabrication Facility

2 inch, 3 inch, 4 inch, 5 inch, 6 inch

AZ12XT, AZ726 Developer, LOR 10B, KMPR, Negative Photoresist, Positive Photoresist, S1813, SPR 220, SPR 995, Unknown

Spin Coater, 200mm Spin Coater, Apogee® 200 Spin Coater, 200X (Legacy), 200 (Legacy)

Source:University of Michigan Lurie Nanofabrication Facility

Material: AZ12XT, AZ726 Developer, LOR 10B, KMPR, Negative Photoresist, Positive Photoresist, S1813, SPR 220, SPR 995, Unknown

Source:Unknown

The University of Michigan Lurie Nanofabrication Facility equipment directory lists multiple Cee® lithography tools, including coating, developing, and Apogee® spin coating platforms within the facility’s lithography area.

Publication Year: Unknown

Process Overview

This Lurie Nanofabrication Facility equipment page functions as a directory of lithography tools and explicitly lists several Cee® systems in active facility use. The lithography section includes a Cee® 100CB Spin Coater, Cee® 200X PR Spin Coater #1, Cee® 200X PR Spin Coater #2, Cee® Developer #1, Cee® Developer #2, and a Cee® Apogee® Spin Coater. Because this page is an index, it confirms installed Cee® equipment at the facility, but it does not provide the detailed material, wafer size, or substrate information that appears on the individual tool pages.

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Related Research

Tools – BioNIUM Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy)

The University of Miami BioNIUM nanofabrication facility tool listing explicitly includes a Cee® 200X Precision Spin Coater as part of its lithography-related equipment set.

Direct Photopatterning of Metal Oxide Structures Using Photosensitive Metallorganics

4 inch

MIBK

Spin Coater, 200mm Spin Coater, 100 (Legacy)

This Georgia Tech paper describes direct photopatterning of mixed-metal oxide films using a photosensitive metallorganic precursor. The precursor films were spin coated onto 100 mm single-side polished silicon wafers using a Cee® Model 100 CB Spin Coater and Bake Unit

Cee® Spin Coater & Baking Tools – University of Kansas Nanofabrication Facility

Unknown

Spin Coater, 200mm Spin Coater, 200X (Legacy), Bake Plates, Apogee® 200 Bake Plate, 1300X (Legacy)

The University of Kansas Nanofabrication Facility lists a Cee® coat and bake workflow that includes a Cee® 200CBX Programmable Spin Coater, Cee® 1300X Hot Plate, and Cee® Apogee® Hot Plate. The page also states that the 200CBX supports multiple chuck sizes for a variety of substrate sizes.