Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

Bake Plate, Spin Coater
Sensor
Materials: Photoresist, PMMA

Small Structures (Wiley).

Apogee® 200 Bake Plate, Apogee® 200 Spin Coater

Wafer Size: Not Specified

Substrate Type: Not Specified

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Publication Year: 2025

Process Overview

This article presents a chiral metasurface structure designed for omnidirectional circularly polarized thermal radiation in the mid-infrared range. In the fabrication flow, PMMA 950 K A4 is used as a spin-coated layer, and the process references both a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate as part of the coating and thermal processing sequence. That makes this a relevant reference for Cee® Apogee® equipment in advanced photonic device fabrication.

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