Cee® 100 Spin Coater – Utah Nanofab Wiki

Spin Coater
Lithography, Nanofabrication, Open Facitlity
Materials: Photoresist

University of Utah Nanofab

Cee® 100 (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

The University of Utah Nanofab wiki lists a Cee® 100 Spin Coater used for photoresist coating in lithography processes within a shared cleanroom environment.

Publication Year: 2022

Process Overview

This University of Utah Nanofab wiki page documents the Cee® 100 Spin Coater as part of the facility’s lithography tool set. The system is explicitly associated with photoresist coating processes, supporting standard cleanroom workflows for patterning and device fabrication. The page serves primarily as a tool reference rather than a detailed process document, but it clearly ties photoresist application to the Cee® 100 Spin Coater, making it a relevant facility-level reference for Cee® equipment in active academic nanofabrication use.

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