Cee® 200X Photoresist Spinner 1 – LNF Wiki

Spin Coater
Nanofabrication, Open Facitlity
Materials: AZ12XT, SPR220

LNF Wiki, University of Michigan Lurie Nanofabrication Facility

Cee® 200X (Legacy)

Wafer Size: Not Specified

Substrate Type: SiC

The University of Michigan LNF Wiki lists a Cee® 200X photoresist spinner as a fully programmable, automatic-dispense coating system with support for 4-inch and 6-inch wafers as well as pieces up to 2 inches.

Publication Year: Unknown

Process Overview

This University of Michigan LNF tool listing identifies a Cee® 200X photoresist spinner used for photoresist coating within the facility. The indexed description explicitly states that the system is fully programmable and includes automatic dispense, with multiple chucks available for 4-inch wafers, 6-inch wafers, and pieces up to 2 inches. The tool is also noted as being located in 1440C, making this a solid university facility reference for a specific legacy Cee® spin coating platform in active cleanroom use.

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