Cee® Apogee® Spin Coater – LNF Wiki

Apogee® 200 Spin Coater
Wafer Size: 150mm, Not Specified
Substrate Type: Not Specified
The University of Michigan LNF Wiki lists a Cee® Apogee® Spin Coater as a fully programmable, manual-dispense photoresist coating system that accepts pieces, 4-inch wafers, and 6-inch wafers.
Publication Year: unknown

Process Overview

This University of Michigan LNF reference identifies a Cee® Apogee® Spin Coater within the facility’s lithography tool set. The indexed tool description explicitly states that it is a fully programmable, manual-dispense, photoresist spin coater and that it can accept pieces, 4-inch wafers, and 6-inch wafers. The broader LNF equipment listing also shows the Cee® Apogee® Spin Coater alongside other lithography tools in the cleanroom, making this a solid university facility reference for active Cee® coating equipment in shared nanofabrication use.

Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.