Cee® Apogee® Spin Coater – Penn Nano Wiki

Spin Coater
Nanofabrication, Open Facitlity
Materials: Photoresist

University of Pennsylvania Singh Center for Nanotechnology (Penn Nano)

Apogee® 200 Spin Coater

Wafer Size: 100mm, 125mm, 150mm, 50mm, 75mm

Substrate Type: Not Specified

The Penn Nano Wiki lists a Cee® Apogee® Spin Coater used for photoresist coating in lithography processes, supporting substrates up to 6-inch wafers within a shared nanofabrication environment.

Publication Year: Unknown

Process Overview

This University of Pennsylvania Penn Nano Wiki entry documents the use of a Cee® Apogee® Spin Coater within the Singh Center cleanroom for photoresist coating applications. The system is explicitly described as a programmable spin coating platform used to apply photoresist films in preparation for lithography. The page indicates that the system supports wafers up to 6 inches, placing it within standard university cleanroom processing capabilities. While the content is focused on tool usage rather than detailed process flows, it clearly ties photoresist coating operations to the Cee® Apogee® Spin Coater, making it a relevant facility reference for active use of Cee® equipment in academic nanofabrication environments.

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