Cee® Apogee Spin Coater – Washington Nanofabrication Facility

Washington Nanofabrication Facility, University of Washington
Apogee® 200 Spin Coater
Wafer Size: Not Specified
Substrate Type: Not Specified
The Washington Nanofabrication Facility tool list explicitly includes a Cee® Apogee Spin Coater within its Lithography and Direct Patterning area.
Publication Year: Unknown

Process Overview

The Washington Nanofabrication Facility lists a Cee® Apogee Spin Coater as part of its open-access cleanroom tool set. The tool is identified on the facility list with Coral ID WNF–SPIN5 and is categorized under Lithography and Direct Patterning, making it a clear university facility reference for Cee® equipment in shared nanofabrication use. The available source snippet does not expose additional details such as materials, wafer size, or linked bake/develop tools, so those should be left unspecified for this entry.

Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.