Cee® Automatic Developer – Texas A&M AggieFab

Spin Developer
Nanofabrication, Open Facitlity
Materials: AZ400K, Developer, DI Water, IPA, MIF300, MIF319, SU-8 Developer

AggieFab (Texas A&M University)

Apogee® 200 Spin Developer

Wafer Size: Not Specified

Substrate Type: Not Specified

Texas A&M AggieFab lists a Cee® Automatic Developer used for photoresist development following exposure, supporting lithography workflows in a university cleanroom.

Publication Year: Unknown

Process Overview

This Texas A&M AggieFab equipment page identifies a Cee® Automatic Developer used for post-exposure photoresist processing within the facility. The system is integrated into lithography workflows, where exposed photoresist is developed using controlled chemical processing to define patterned features. The page ties the developer directly to standard cleanroom operations, supporting consistent and repeatable development steps following coating and exposure. This makes it a strong facility-level reference showing use of Cee® equipment beyond coating, extending into automated development processes within academic nanofabrication environments.

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