Cee® Lithography Tools – Utah Nanofab

Bake Plate, Spin Coater
Nanofabrication, Open Facitlity
Materials: Antireflective Coating, AZ Barli II, AZ40XT, AZ9260, HMDS, LOR10B, maP 1275, MiR 701, nLOF 2020, S1813, SU-8

University of Utah Nanofab

Apogee® 200 Bake Plate, Apogee® 200 Spin Coater, Cee® 200X (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

Utah Nanofab lists multiple specific Cee® tools across its cleanroom lithography workflow, including legacy Cee® 100 and 200X-series spinners, a Cee® 200XD develop spinner, and current-generation Apogee® spin coat and bake capability. The site also explicitly lists supported resist materials used within its photolithography process set.

Publication Year: Unknown

Process Overview

Utah Nanofab presents Cee® equipment as part of its open-access photolithography infrastructure. Its equipment pages and tool lists explicitly reference Cee® 100, Cee® 200X 1800 Spinner, Cee® 200X 9260 Spinner, Cee® 200XD Develop Spinner, Cee® Apogee Spin Coater, and Cee® Apogee N2 Hot Plate. Together, these pages show coverage across coating, bake, and develop steps within the facility’s lithography workflow. The Utah Nanofab process pages also explicitly list photoresist and lithography materials used with this workflow, including S1813, nLOF 2020, LOR 10B, SU8, HMDS, and additional AZ-series materials. That makes this a strong university facility reference because it ties named Cee® platforms to a clearly defined cleanroom photolithography process set rather than just listing generic spin-coating capability.

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Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

Spin Coater
Bio, Microfluidics
Materials: OSTE-AS Polymer

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

Bake Plate, Spin Coater
Sensor
Materials: Photoresist, PMMA

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

Spin Coater
Materials: AZ4620, HMDS, LOR10B, PDMS, Photoresist, S1805, SU-8

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.