Cee® Spin Coater #1 and #2 – ASU NanoFab

Bake Plate, Spin Coater
Lithography, Nanofabrication, Open Facitlity
Materials: Photoresist

Arizona State University Core Research Facilities, NanoFab

Cee® 1300X (Legacy), Cee® 200X (Legacy)

Wafer Size: 100mm, 125mm, 150mm, 200mm, 50mm, 75mm

Substrate Type: Not Specified

ASU NanoFab lists Cee® Spin Coater #1 and #2 as photoresist coating systems in its cleanroom. The page explicitly identifies Cee® Spin Coater #1 as having a programmable precision hot plate bake, Cee® Spin Coater #2 as a stand-alone Spin Coater, and names the Cee® 200CBX precision coat-bake system as the integrated platform.

Publication Year: Unknown

Process Overview

This ASU NanoFab equipment listing identifies two Cee® photoresist coating systems within the facility’s lithography tool set. The page states that Cee® Spin Coater #1 includes a programmable Precision Hot Plate Bake, while Cee® Spin Coater #2 is configured as a stand-alone Spin Coater. It also explicitly names the Cee® 200CBX precision coat-bake system, describing it as a track-quality precision Spin Coater combined with a high-uniformity bake plate and a Windows-based graphical user interface for program entry, monitoring, and storage. The page further states that these systems apply coatings to substrates up to 200 mm round or 7-inch square, with all coatings hand dispensed using pipettes. That makes this a strong university facility reference because it ties specific Cee® platform names to defined coating and bake capability in active cleanroom use.

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