Cee® Spin Coater #1 and #2 – ASU NanoFab

How Cee® equipment is used

This ASU NanoFab equipment listing identifies two Cee® photoresist coating systems within the facility’s lithography tool set. The page states that Cee® Spin Coater #1 includes a programmable Precision Hot Plate Bake, while Cee® Spin Coater #2 is configured as a stand-alone Spin Coater. It also explicitly names the Cee® 200CBX precision coat-bake system, describing it as a track-quality precision Spin Coater combined with a high-uniformity bake plate and a Windows-based graphical user interface for program entry, monitoring, and storage. The page further states that these systems apply coatings to substrates up to 200 mm round or 7-inch square, with all coatings hand dispensed using pipettes.

Equipment reported

Cee® 200CBX; Cee® stand-alone spin coater

Source type

Facility reference

Publication year

Not recorded

Materials

Photoresist

Substrate

Not reported

Source

Arizona State University Core Research Facilities, NanoFab

Process context

This is a facility equipment reference. It documents the listed capability rather than a particular research result. Confirm current access, training, and operating procedures with the facility. Materials recorded for this reference include Photoresist.