DNA origami directed nanometer-scale integration of colloidal quantum emitters with silicon photonics

Spin Coater
Photonics
Materials: nLOF 2020, PMMA

bioRxiv preprint

Apogee® 200 Spin Coater

Wafer Size: Not Specified

Substrate Type: Si

This preprint presents a method for integrating colloidal quantum emitters with silicon photonic structures using lithographically defined resist cavities. The accessible full-text snippets explicitly identify AZ-nLOF 2020 coated on a Cee® Apogee Spin Coater at 2000 rpm for 60 s, with PMMA also referenced in the process flow.

Publication Year: 2025

Process Overview

This work introduces a lithography-enabled process for positioning colloidal quantum emitters on silicon photonic structures such as waveguides, micro-ring resonators, and bullseye cavities. In the fabrication flow, the accessible source snippets explicitly state that AZ-nLOF 2020 is coated using a Cee® Apogee Spin Coater at 2000 rpm for 60 seconds. The paper also explicitly references PMMA resist in the lift-off sequence, tying the Cee® coating step to the broader nanophotonic fabrication process. Based on the accessible text, this is a strong reference for Cee® Apogee use in advanced university photonics research.

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