Lithography Equipment – Washington University in St. Louis Micronanofabrication Facility

Spin Coater
Lithography, Nanofabrication, Open Facitlity
Materials: Unknown

Washington University in St. Louis, Institute of Materials Science & Engineering (IMSE)

Apogee® 200 Spin Coater

Wafer Size: Not Specified

Substrate Type: Not Specified

Washington University’s Micronanofabrication Facility lists Cee® Spin Coaters as part of its lithography equipment, supporting photoresist coating and bake processes in an academic cleanroom environment.

Publication Year: Unknown

Process Overview

This Washington University Micronanofabrication Facility page outlines lithography capabilities, explicitly including Cee® Spin Coaters for photoresist coating and Cee® Hot Plates for bake processing steps. These tools support standard lithography workflows, where photoresist is applied to substrates and thermally processed prior to exposure and development. While the page does not provide detailed process parameters, it clearly ties both coating and bake steps to Cee® equipment, reinforcing their role in integrated lithography processing within a university cleanroom setting. This makes it a strong facility-level reference showing both spin coating and thermal processing capabilities using Cee® platforms.

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Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

Spin Coater
Bio, Microfluidics
Materials: OSTE-AS Polymer

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

Bake Plate, Spin Coater
Sensor
Materials: Photoresist, PMMA

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

Spin Coater
Materials: AZ4620, HMDS, LOR10B, PDMS, Photoresist, S1805, SU-8

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.