New Equipment at CNF – Cee® Model 100 Spin Coaters

Spin Coater
Open Facitlity
Materials: Unknown

Cornell NanoScale Facility, Cornell University

Cee® 100 (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

This Cornell NanoScale Facility newsletter identifies two bench-top mounted Cee® Model 100 Spin Coaters used for resist coating of wafers, with support for substrates up to 200 mm round or 6-inch square.

Publication Year: 2004

Process Overview

n the “New Equipment at CNF” section, Cornell NanoScale Facility explicitly lists Cee® Model 100 Spin Coaters as part of its tool set. The article states that CNF has two bench-top mounted Cee Model 100 systems used for resist coating of wafers. It also notes that each unit has 10 available recipes with up to 10-step programming for acceleration, speed, and time. The listed capability covers up to 200 mm round or 6-inch square substrates, making this a strong facility reference for legacy Cee® coating equipment in active university nanofabrication use.

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