PDMS Spin Coater – University of Kansas Nanofabrication Facility

Spin Coater
Open Facitlity
Materials: PDMS

University of Kansas Nanofabrication Facility

Cee® 100 (Legacy)

Wafer Size: Not Specified

Substrate Type: Not Specified

The University of Kansas Nanofabrication Facility lists a Cee® Spin Coater dedicated to PDMS coating, supporting soft lithography and polymer-based device fabrication processes.

Publication Year: Unkown

Process Overview

This University of Kansas facility page documents the use of a Cee® Spin Coater specifically for processing PDMS (polydimethylsiloxane). The page highlights spin coating as a method to control PDMS film thickness for applications such as soft lithography and microfluidic device fabrication. Unlike standard photoresist workflows, this reference emphasizes polymer processing, showing that the Cee® Spin Coater is used beyond traditional lithography to handle viscous materials like PDMS. This makes it a strong example of expanded application use, where controlled spin coating enables uniform elastomer layers critical for replication and device formation in soft lithography environments.

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