Spin Coating – University of Kentucky CeNSE

University of Kentucky Center for Nanoscale Science and Engineering (CeNSE)
Cee® 100 (Legacy)
Wafer Size: Not Specified
Substrate Type: Not Specified
The University of Kentucky CeNSE spin coating page explicitly references the Cee® Model 100 and 150 and describes them as part of the facility’s spin coating capability for thin-film application.
Publication Year: Unknown

Process Overview

his University of Kentucky CeNSE page describes spin coating as a process for applying thin films and explicitly identifies the Cee® Model 100 and 150. The page states that the system incorporates a stainless steel spin bowl, PTFE drain and exhaust connections, a hardened alloy steel spindle, a toothed belt drive, a servo motor, and an integral optical encoder for closed-loop digital motor control. It also explains that each program on a Cee® Spin Coater may contain up to ten separate process steps, supporting more complex coating requirements when needed.

Related Research

Off-Stoichiometry Thiol–Ene Polymers: Inclusion of Anchor Groups Using Allylsilanes

This paper develops OSTE-AS polymers for bonding and integration with silicon wafers and explicitly states that the OSTE-AS prepolymers were deposited on silicon wafers using a Cee® Apogee® Spin Coater module of an X-Pro II Workstation. The paper also reports 100 mm silicon wafers and gives resulting film thicknesses of 12.9 µm, 4.9 µm, and 3.4 µm at 1000, 3000, and 5000 rpm, respectively.

Omnidirectional Circularly Polarized Thermal Radiation Enabled by Chiral Metasurface

This paper describes fabrication of a chiral metasurface for circularly polarized thermal radiation and includes use of a Cee® Apogee® Spin Coater and Cee® Apogee® Bake Plate in the sample preparation flow, including spin coating of PMMA 950 K A4.

Microfluidic Bioelectrochemical Cell Platform for the Study of Extracellular Electron Uptake in Microbes

This preprint describes fabrication of a glass-based microfluidic bioelectrochemical cell platform and explicitly states that KL8020 HMDS Spin-On Primer was spin coated on 100 mm borosilicate glass wafers using an Apogee® Spin Coater. The broader lithography flow also includes spin-coated LOR 10B, Microposit™ S1805™, AZ P4620, and SU-8 2100.