The Apogee® 450 Spin Developer is designed to handle your large, heavy substrates with high torque, an expanded bowl capacity, and modern controls. Its sleek tabletop design seamlessly integrates into any lab or fabrication environment, helping you scale and optimize your processes.
Accommodate a wide range of substrate configurations, from standard wafers to unique geometries and specialized materials. The adaptable design handles substrates well beyond traditional semiconductor specifications, making it ideal for research facilities and manufacturers working with custom dimensions.
Ultra-thin wafers? Film frames? Photomasks? Custom shapes? No problem!
Whether you need a single tool or ten, fume control or a cleanroom environment, the Cee® X-Pro II Workstation is the perfect alternative to typical wet benches.
Apogee® Spin Developers provide flexibility, repeatability, and long-lasting durability for the most challenging applications. Rely on cutting-edge technology and top-tier process support to drive your success at every stage.
Engineered for superior performance, usability, versatility—and peace of mind.
On-board 7-inch color touchscreen with DataStream™ OS included for visibility and your ease-of-use.
Integrated splash ring prevents droplets from redepositing onto the wafer for a contamination-free surface and defect-free results.
A brushless motor and indirect drive with oversized bearings/belt provide unmatched uptime, thermal isolation, and performance.
The built-in spindle fluid deflector keeps liquids out of your drive train and bearings, without purge gases.
Integrated PFA fluid trap protects your vacuum components and pumps from unwanted contamination and blockage.
Sophisticated fluid separator evacuates chemical fumes while safely guiding fluid waste to the drain.
Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.
Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.
Access your Apogee® Spin Developer remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.
NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.
Cee® spin developers are NRTL listed right out of the box…
…your safety department is going to love you.
When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.
Discover a whole new level of control with AccuScan™ Dispense; a programmable scanning arm offering precision dispense and edge bead removal.
Got incompatible materials? Divert, isolate, and route waste through multiple paths. Switch mid-process with recipe-controlled functionality.
Challenge accepted! Any size, shape, material, or design, Cee® tailored spin chucks are expertly matched to your substrates.
450mm Round or 14″ x 14″ Square
6,000 rpm
30,000 rpm/s
0.2 rpm
< 0.2 rpm/s
0.2 rpm
7″ Full Color Touchscreen
Unlimited
0.1 s
115 lb (52.2kg) – Add X-Pro II Workstation for Final Weight
200 lb (90.7kg) – Add X-Pro II Workstation for Final Shipping Weight
N/A (Pre-Installed Into X-Pro II Workstation)
N/A (Pre-Installed Into X-Pro II Workstation)
208-230 VAC (Supplied by X-Pro II Workstation)
3/4″ OD
6A (max) (Supplied by X-Pro II Workstation)
1.5″ OD, 0.4” H2O @ 30CFM (100Pa @ 50CMH)
1/4″ Push to Connect, <20″ Hg 33kPa abs (Supplied by X-Pro II Workstation)
70psi (482kPa) (Supplied by X-Pro II Workstation)
With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.
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Cee® is a registered trademark of Cost Effective Equipment, LLC.
