Porous Spin Chucks

Porous Spin Chucks support thin wafers, films, and foils with a porous insert inside a substrate-matched chuck. Distributed vacuum and backside support make them an option for delicate substrates that need more support than a conventional circular vacuum chuck.

  • Designed for thin wafers, films, and foils
  • Porous ceramic insert distributes vacuum over the supported area
  • Substrate-matched cavity and support geometry
  • Made to substrate width, length, and thickness
  • Material options chosen for process compatibility

Made to order

Each porous chuck is custom made for your substrate dimensions and process requirements.

SKU unavailable — custom made to order.

Product Information

Distributed Vacuum and Backside Support

A porous chuck combines a substrate-matched recessed cavity with a porous ceramic insert. The insert spreads vacuum across the supported area and provides broad backside support, helping reduce deflection in thin wafers, flexible films and metal foils.

Support for Delicate Substrates

Thin and flexible materials can bow or distort when held over a small vacuum contact area. Supporting the substrate across the porous surface helps maintain its shape during spin processing. Substrate thickness, flexibility, geometry and backside-contact requirements are evaluated together to define the support arrangement.

Made for the Substrate

The cavity and insert footprint are made for the specified piece. The substrate must cover the entire porous surface to maintain the intended vacuum holding arrangement. For circular applications that require additional positioning assistance, a matched centering device can be considered.

Define the Substrate and Process

Provide substrate shape, width or diameter, length, thickness, material and a drawing when available. Describe flexibility, backside-contact restrictions, chemistry, intended spin conditions and the Cee tool to be used.

Choose Compatible Materials

The support insert is porous ceramic. Chuck-body material options include Delrin®, PVDF, PTFE, stainless steel, PEEK and anodized aluminum. Match the body material, porous support and tool interface to the process chemistry and contact requirements.

Handle the Matched Insert

Use the insert and chuck specified for the substrate. Insert removal varies by design, including push-pin, slot-access and permanent-insert arrangements. Use the supplied procedure, keep the support surface clean and inspect it as part of routine tool checks.

Substrates

Thin wafers, films, and foils

Support

Porous ceramic insert in a recessed cavity

Vacuum Distribution

Across the porous support surface

Utilities & Tool Fit

Retention

Vacuum through the porous insert

Coverage

Entire porous surface covered by the substrate

Operating Limits

Depend on substrate and chuck configuration

Find the right chuck for your substrate.