Information advantage in sensing revealed by Fano-resonant Fourier scatterometry

How Cee® equipment is used

HSQ was spin coated to a reported thickness of 60 nm at 8000 rpm for 60 s, with an acceleration of 1000 rpm/s. Electron-beam lithography and plasma etching then defined the silicon metarings. The substrate was a glass coverslip carrying 120 nm of amorphous silicon; its lateral dimensions were not specified. The paper identifies the Cee® coater for resist deposition and does not identify the bake equipment manufacturer. Source: Methods, Sample design and nanofabrication.

Equipment reported

Apogee® 200 Spin Coater

Source type

Research paper

Publication year

2025

Materials

HSQ

Substrate

Glass

Source

Nature Communications (Springer Nature)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include HSQ.