A digital single-molecule nanopillar SERS platform for predicting and monitoring immune toxicities in immunotherapy

How Cee® equipment is used

The pillar arrays were fabricated on 4-inch silicon wafers. Two PMMA layers, 495K A4 beneath 950K A4, were each spin coated at 1500 rpm for 60 seconds using the named Cee® Apogee® coater. Electron-beam lithography defined the pillar pattern. The methods identify the Apogee® family but do not specify a 200 or 450 model. Source: Methods, Fabrication of pillar arrays.

Equipment reported

Apogee® Spin Coater; model size not reported

Source type

Research paper

Publication year

2021

Materials

PMMA

Substrate

Si

Source

Nature Communications (Springer Nature)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include PMMA.