A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices

How Cee® equipment is used

The methods explicitly identify a Brewer Science Cee® 200 for CYTOP and photoresist coating. The demonstrated display used ITO-coated glass substrates and patterned SU-8 grids. A deposited sacrificial layer between the fluoropolymer and resist enabled lithographic patterning while preserving the exposed surface's hydrophobicity. The work includes Nanjing Jingaowei Optoelectronic Technology alongside university researchers. No experimental wafer diameter is specified.

Equipment reported

Cee® 200

Source type

Research paper

Publication year

2017

Materials

CYTOP, Photoresist, SU-8

Substrate

Glass

Source

Scientific Reports (Springer Nature)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include CYTOP, Photoresist, SU-8.