Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies

How Cee® equipment is used

PMMA and an MMA–MAA copolymer were spin coated on silicon wafers using the named Cee® 200 to form approximately 100 nm layers. Coating and soft-bake steps were repeated to build the multilayer stack before electron-beam patterning. The coating method does not specify wafer diameter or spin speed. Source: Methods, Design and fabrication of bio-inspired nanostructures.

Equipment reported

Cee® 200

Source type

Research paper

Publication year

2015

Materials

Photoresist, PMMA

Substrate

Si

Source

Nature Communications (Springer Nature)

Process context

The process details describe the cited work. Reported recipes and results depend on the authors’ materials, substrates, and equipment configuration. Materials recorded for this reference include Photoresist, PMMA.